Description of service:Mask Aligner EVG 6/2 for photolithographic exposure of round substrates (1", 2", 3", 4", 5", 6") with max. 10mm thickness and mask sizes up to 6". Although max. 6" substrate holders were successfully exposed on both sides, in particular in 2010 many 8 inch (200mm) Si wafers were exposed on two sides.   Front and rear exposure (e.g. for the production of membranes) possible.Soft contact; hard contact; vacuum contact; Proximity exposure adjustable. Interval exposure for thick, non-chemical-reinforced resiste possibleJustification accuracy according to specification 1.25μm, realistic are approx.5μm. exposure wavelength: 365nmsub-μm resolution depending on resistance layer thickness is attainable  Condition description:Latzer Service by manufacturer EVG was estimated in 2012 or 2015. Mask holder and substrate holder with ruler are complete, replacement lenses are available. Last test on 05.08.2026 after about 2 years without use: Turn on the electrics: okZünden the mercury vapour lamp: ok -> Light integrator reports "lamp too old, should be changed"; Starting the electronics: okOutput on left tube monitor: okKeyboard field: ok (by the way looks like on the first day) IMPORTANT: Before starting/initializing the auxiliary position must be approached. Otherwise, the table mechanism is stuck and a once-password must be "purchased" at EVG (~150€)Starting the auxiliary position: okInitialization: okLoading the mask holder and pressure sensor calibration: okLaden the mask with bypassing the vacuum sensor and some tutoring at the table mechanics: okCharging the substrate holder: okLOAD the substrate with bypass of the vacuum sensors and some Teaching the table mechanism: okOutput of the microscope lens images on the tube monitor (right) seems faulty Exposure: NOT ok -> Pressure box broke; seems to be a FESTO standard part. Repair seems possible   Extensive documentation available. Among other things, descriptions of all electronic assemblies (as of 1985) and an original EVG_VHS video cassette.    The device is located in the cleanroom122 of the neighbouring institute IPHT (Beutenberg Campus, Albert-Einstein-Str. 9, 07745 Jena); Loading via material lock_North/Hubbühne